Sample preprarion
Pulsed Laser Deposition (PLD) System
-
Pulsed Laser (KrF Excimer), ComPexPro 102F
-
pulse width : 20 ns
-
max. repetition rate 20 Hz
-
energy density 2 J/cm^2
-
-
Two-vacuum Chamer; Load-lock & deposition chamber (base vacuum < 10^-7 Torr)
-
Two gas (Ar/O2)
-
in-situ 4-target loading
-
Max substrate temp. 900C
Chemical Vapor Deposition (CVD) System (3 ea)
-
Two temp. control zone
-
Solid/gas source
-
Pressure control
-
Sufur/Selenizum rich-enviorment
-
Max. Temp. 1050 C
Electro-spray System (ESP 100, NanoNC)
-
High voltage - 30 kV/2 mA
-
Precision fluid metering pump; 10 microliter ~ 60 mililiter
-
dual concentric nozzle
Device fabrication
Micromanipulator
-
Postion (xyz & rotation stage) control
-
x50 (working distane 18mm)
-
1" mold heater & vacuum chuk
Thermal Evaporator
-
Al, Au electrode
Mask Aligner & Exposure System (MDA-400M, MIDAS)
-
Sample size; 4 inch wafer
-
Mask size: 5 x 5 inch
-
Light source module: UV Lamp, max >25 mW/cm2@ 365nm
-
Microsocpe: 80 - 1,000x maginification, WD: 86 mm
-
Stage/Controller
-
Resolution
-
1 um @ vacuum check mode
-
1.5 um @ hard contack mode
-
Measurement system
micro-Raman/PL System
-
Excitation source; solid-state laser
(473nm, 100mW, TEM 00 mode) (Model; BLK 73100 TS)
-
Detector:cooled CCD detector (iDus 420, Andor)
-
Microsocpe; infinity correcte4d MPLAN objective lens
(x100, x50, x10)
-
Monochrometor(model: Monora 500i)
1800/1200/300 grove/500 nm blazed
-
Mapping system; XY 100 mm
-
Sample temp. control range: LN2 - 450 C
(Model: LTS420E-PB Stage)
Electrochemical Analyser (Compactsat, Ivium)
-
Electrochemical Impedance Spectrosocpy@ 10 uHz - 8 MHz
-
Solarcell analysis
-
Intensity modulation light source (ModuLinght)
-
10 uHz - 2 MHz
-
Radiant flux: 0 - 278 mW
-
